Thermal expansion of the V5Si3 and T2 phases of the V-Si-B system investigated by high-temperature X-ray diffraction

Intermetallics

Volumn 17, Issue 10, 2009, Pages 792-795

  Rodrigues, Geovani ^a   Nunes, Carlos Angelo ^b   Suzuki, Paulo Atsushi ^b   Coelho, Gilberto Carvalho ^b  

^a Centro Universitário de Volta Redonda UniFoa Núcleo de Pesquisa Campus Três Poços   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

A. Silicides, various; A. Ternary alloy system; B. Anisotropy; B. Thermal properties; F. Diffraction

Indexed keywords

A. SILICIDES, VARIOUS; A. TERNARY ALLOY SYSTEM; B. ANISOTROPY; B. THERMAL PROPERTIES; F. DIFFRACTION;

ALLOYING; ANISOTROPY; ARGON; DIFFRACTION; MOLYBDENUM; NIOBIUM; NIOBIUM ALLOYS; SILICIDES; SILICON; SILICON ALLOYS; SUPERCONDUCTING FILMS; TERNARY ALLOYS; TERNARY SYSTEMS; THERMAL STRESS; X RAY DIFFRACTION;

THERMAL EXPANSION;

EID: 67349197816     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2009.03.006     Document Type: Article

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