Thermal expansion of the W5Si3 and T2 phases of the W-Si-B system investigated by high-temperature X-ray diffraction

Intermetallics

Volumn 15, Issue 3, 2007, Pages 241-244

  Rodrigues, Geovani ^a   Chad, Vanessa Motta ^a   Nunes, Carlos Angelo ^a   Suzuki, Paulo Atsushi ^a   Coelho, Gilberto Carvalho ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

A. Silicides, various; A. Ternary alloy system; B. Anisotropy; B. Thermal properties; F. Diffraction

Indexed keywords

HEAT TREATMENT; HIGH TEMPERATURE OPERATIONS; MELTING; PHASE TRANSITIONS; THERMAL EXPANSION; X RAY DIFFRACTION ANALYSIS;

ARC MELTING; HIGH-PURITY MATERIALS; SILICIDES; TEMPERATURE INTERVALS; TERNARY ALLOY SYSTEMS; THERMAL EXPANSION COEFFICIENTS;

TUNGSTEN ALLOYS;

EID: 33845359125     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2006.05.016     Document Type: Article

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