Thermal expansion anisotropy and site occupation of the pseudo-binary molybdenum vanadium silicide Mo5Si3-V5Si 3

Acta Materialia

Volumn 53, Issue 8, 2005, Pages 2431-2437

  Rawn, C J ^a   Schneibel, J H ^a   Fu, C L ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Silicides; Thermal expansion; X ray diffraction

Indexed keywords

ANISOTROPY; CHEMICAL BONDS; COMPUTATIONAL METHODS; MOLYBDENUM COMPOUNDS; THERMAL EXPANSION; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

COEFFICIENT OF THERMAL EXPANSION (CTE); LATTICE ANHARMONICITY; SILICIDES; SITE OCCUPATION;

BINARY MIXTURES;

EID: 16344367265     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2005.02.005     Document Type: Article

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