Structural and optical characteristics of Er-doped SRSO layers deposited by the confocal sputtering technique

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 6, 2009, Pages 1067-1070

  Hijazi, K ^a   Khomenkova, L ^a   Cardin, J ^a   Gourbilleau, F ^a   Rizk, R ^a  

^a UNIVERSITÉ DE CAEN   (France)

Author keywords

Erbium; Photoluminescence; Reactive magnetron sputtering; Si nanocluster

Indexed keywords

ANNEALING CONDITIONS; DEPOSITED LAYERS; EMISSION LIFETIMES; ER-DOPED; MAGNETRON CO-SPUTTERING; NON-RESONANT; OPTICAL CHARACTERISTICS; PL INTENSITIES; PURE-ARGON PLASMAS; REACTIVE MAGNETRON SPUTTERING; RF-POWER; SI NANOCLUSTER; SPUTTERING TECHNIQUES; STRUCTURAL AND OPTICAL PROPERTIES;

AMORPHOUS FILMS; ANNEALING; ARGON; CATHODES; ELECTRON TUBES; MAGNETRONS; NANOCLUSTERS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SILICA; SILICON; SILICON COMPOUNDS; SILICON OXIDES;

ERBIUM;

EID: 67349132620     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2008.08.048     Document Type: Article

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