Structure and ferro/piezoelectric properties of SrBi4Ti4O15 films deposited on TiO2 buffer layer

Journal of Alloys and Compounds

Volumn 477, Issue 1-2, 2009, Pages 85-89

  Simoes A Z ^a   Aguiar, E C ^b   Riccardi, C S ^b   Moura, F ^b   Longo, E ^b   Varela, J A ^b  

^a FEDERAL UNIVERSITY OF ITAJUBÁ   (Brazil)

^b SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

Bismuth layered compounds; Buffer layer; Thin films

Indexed keywords

BOTTOM ELECTRODES; C-AXIS DIRECTIONS; CHEMICAL SOLUTIONS; DIELECTRIC AND FERROELECTRIC PROPERTIES; ELECTRICAL PROPERTIES; INTEGRATED DEVICES; RANDOM ORIENTATIONS; SI SUBSTRATES; SINGLE PHASE; X- RAY DIFFRACTIONS;

BISMUTH; BISMUTH COMPOUNDS; BUFFER LAYERS; ELECTRIC PROPERTIES; FERROELECTRICITY; OXIDE MINERALS; PEROVSKITE; PLATINUM; THIN FILM DEVICES; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 67349121779     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.10.138     Document Type: Article

References (16)

1. Wu D., Li A., Zhu T., Liu Z., and Ming N. J. Appl. Phys. 88 (2000) 5941
2. Hirose M., Suzuki T., Oka H., Itakura K., Miyauchi Y., and Tsukada T. Jpn. J. Appl. Phys. 38 (1999) 5561
3. Lrie H., and Miyayama M. Appl. Phys. Lett. 79 (2001) 251
4. Noguchi Y., Miyayama M., and Kudo T. Appl. Phys. Lett. 77 (2000) 3639
5. Zhang S.T., Yang B., Chen Y.F., Liu Z.G., Yin X.B., and Wang Y. J. Appl. Phys. 91 (2002) 3160
6. Zhang S.-T., Sun B., Yang B., Chen Y.F., Liu Z.G., and Ming N.B. Mater. Lett. 47 (2001) 334
7. Sohn D.S., Xianyu W.X., Lee W.I., and Chung I. Appl. Phys. Lett. 79 (2001) 3672
8. Hu G.D., Wilson I.H., Xu J.B., Li C.P., and Wong S.P. Appl. Phys. Lett. 76 (2000) 1758
9. Lee H.N., Hesse D., Zakharov N., and Grosele U. Science 296 (2002) 2006
10. Matsuda H., Ito S., and Iijima T. Appl. Phys. Lett. 83 (2003) 5023
11. Watanabe T., Funakubo H., Saito K., Suzuki T., Fujimoto M., Osada M., Noguchi Y., and Miyayama M. Appl. Phys. Lett. 81 (2002) 1660
12. Simões A.Z., Ramirez M.A., Riccardi C.S., Longo E., and Varela J.A. Mater. Lett. 60 (2006) 2020
13. Kato K., Suzuki K., Tanaka K., Fu D., Nishizawa K., and Miki T. Appl. Phys. A 81 (2005) 861
14. Watanabe H., Mihara T., Yoshimori H., and Araujo C.A. Jpn. J. Appl. Phys. Part 1 34 (1995) 5240
15. Irie H., and Miyayama M. Appl. Phys. Lett. 79 (2001) 251
16. Kalinin S.V., and Bonnell D.A. Appl. Phys. Lett. 78 (2001) 1116