Soft UV-based nanoimprint lithography for large area imprinting applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Glinsner, T ^a   Plachetka, U ^b   Matthias, T ^c   Wimplinger, M ^c   Lindner, P ^a  

^a EVGroup ^*  (Austria)

^b AMO GMBH   (Germany)

^c EV Group Inc   (United States)

Author keywords

Nanoimprint lithography; NIL; Soft UV NIL; UV based nanoimprint lithography; UV NIL

Indexed keywords

PROJECTION OPTICS;

COST EFFECTIVENESS; OPTICS; SEMICONDUCTOR MATERIALS;

NANOIMPRINT LITHOGRAPHY;

COST EFFECTIVENESS; LITHOGRAPHY; OPTICS; PRINTING; SEMICONDUCTORS;

EID: 35148849112     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713026     Document Type: Conference Paper

References (5)

1. MD Stewart et. al., "Direct Imprinting of Dielectric Materials for Dual Damascene Processing" Proc. SPIE 5751 p. 210-218 (2005)
2. P.Dorsey et. al., Diskrete Track Recording (DTR) Media Fabricated using Nanoimprint Lithography, NNT, December 1-3, 2004.
3. N. Roos, T. Luxbacher, T. Glinsner, K. Pfeiffer, H. Schultz, and H.-C. Scheer, in Nanoimprint lithography with a commercial 4 inch bond system for hot embossing, Proceedings of Microlithography Conference, Santa Clara, California, 2001.
4. U. Plachetka et. al., "Comparison of multilayerstamp concepts in UV-NIL" Microelectronic Engineering 83 (2006) 944-947
5. B. Michel, A. Bernard, A. Bietsch, E. Delamarche, M. Geissler, D. Junker, H. Kind, J.-P. Renault, H. Rothuizen, H. Schmid, P. Schmidt-Winkel, R. Stutz, and H. Wolf, "Printing meeting Lithography" Journal of Research and Development 45 (2001).