Transport of energetic electrons in a magnetically expanding helicon double layer plasma

Applied Physics Letters

Volumn 94, Issue 19, 2009, Pages

  Takahashi, Kazunori ^a,b,c   Charles, Christine ^a   Boswell, Rod ^a   Cox, Wes ^a   Hatakeyama, Rikizo ^b  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b TOHOKU UNIVERSITY   (Japan)

^c IWATE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER WALLS; DIFFUSION CHAMBER; DOUBLE LAYERS; ELECTRON DENSITIES; ELECTRON ENERGY PROBABILITY FUNCTIONS; ENERGETIC ELECTRON; FIELD LINES; LOCAL MAXIMUM; MAGNETIC FIELD LINE;

ABERRATIONS; ELECTRONS; HOT ELECTRONS; MAGNETIC FIELDS; PLASMAS;

ELECTRON TEMPERATURE;

EID: 67049143919     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3136721     Document Type: Article

References (22)

1. C. Charles and R. Boswell, Appl. Phys. Lett. 0003-6951 82, 1356 (2003). 10.1063/1.1557319
2. S. A. Cohen, N. S. Siefert, S. Stange, R. F. Boivin, E. E. Scime, and F. M. Levinton, Phys. Plasmas 1070-664X 10, 2593 (2003). 10.1063/1.1568342
3. C. Charles and R. W. Boswell, Phys. Plasmas 1070-664X 11, 1706 (2004). 10.1063/1.1652058
4. M. D. West, C. Charles, R. W. Boswell, and J. Propul, Power 0032-5929 24, 134 (2008).
5. X. Sun, A. M. Keesee, C. Biloiu, E. E. Scime, A. Meige, C. Charles, and R. W. Boswell, Phys. Rev. Lett. 0031-9007 95, 025004 (2005). 10.1103/PhysRevLett.95.025004
6. N. Plihon, P. Chabert, and C. S. Corr, Phys. Plasmas 1070-664X 14, 013506 (2007). 10.1063/1.2424429
7. C. Charles, Plasma Sources Sci. Technol. 0963-0252 16, R1 (2007). 10.1088/0963-0252/16/4/R01
8. I. A. Biloiu, E. E. Scime, and C. Biloiu, Appl. Phys. Lett. 0003-6951 92, 191502 (2008). 10.1063/1.2927478
9. K. Takahashi, K. Oguni, H. Yamada, and T. Fujiwara, Phys. Plasmas 1070-664X 15, 084501 (2008). 10.1063/1.2965497
10. K. Takahashi, C. Charles, R. W. Boswell, T. Kaneko, and R. Hatakeyama, Phys. Plasmas 1070-664X 14, 114503 (2007). 10.1063/1.2803763
11. F. F. Chen, Phys. Plasmas 1070-664X 13, 034502 (2006). 10.1063/1.2179393
12. M. A. Lieberman and C. Charles, Phys. Rev. Lett. 0031-9007 97, 045003 (2006). 10.1103/PhysRevLett.97.045003
13. M. A. Lieberman, C. Charles, and R. W. Boswell, J. Phys. D 0022-3727 39, 3294 (2006). 10.1088/0022-3727/39/15/011
14. A. Meige, R. W. Boswell, C. Charles, and M. M. Turner, Phys. Plasmas 1070-664X 12, 052317 (2005). 10.1063/1.1897390
15. A. Meige and R. W. Boswell, Phys. Plasmas 1070-664X 13, 092104 (2006). 10.1063/1.2339024
16. C. Charles, IEEE Trans. Plasma Sci. 0093-3813 33, 336 (2005). 10.1109/TPS.2005.844958
17. C. Charles, R. W. Boswell, and M. A. Lieberman, Appl. Phys. Lett. 0003-6951 89, 261503 (2006). 10.1063/1.2426881
18. W. Cox, C. Charles, R. W. Boswell, and R. Hawkins, Appl. Phys. Lett. 0003-6951 93, 071505 (2008). 10.1063/1.2965866
19. W. Cox, R. Hawkins, C. Charles, and R. W. Boswell, IEEE Trans. Plasma Sci. 0093-3813 36, 1386 (2008). 10.1109/TPS.2008.924429
20. K. Takahashi and T. Fujiwara, Appl. Phys. Lett. 0003-6951 94, 061502 (2009). 10.1063/1.3080205
21. K. Takahashi, C. Charles, R. W. Boswell, and R. Hatakeyama, Phys. Plasmas 1070-664X 15, 074505 (2008). 10.1063/1.2959137
22. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material Processing, 2nd ed. (Wiley, New York, 2005), Chap..