Physical mechanism of current-free double layers

Physics of Plasmas

Volumn 13, Issue 3, 2006, Pages

  Chen, Francis F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOHM CRITERION; ION ACCELERATION; SHEATH INSTABILITY;

IONS; MAGNETIC FIELDS; PLASMA CONFINEMENT;

PLASMAS;

EID: 33645669626     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2179393     Document Type: Article

References (15)

1. C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1557319 82, 1356 (2003); C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1643548 84, 332 (2004); C. Charles, Phys. Plasmas 1070-664X 10.1063/1.1652058 11, 1706 (2004); C. Charles, Phys. Plasmas 12, 044 508 (2005).
2. C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1557319 82, 1356 (2003); C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1643548 84, 332 (2004); C. Charles, Phys. Plasmas 1070-664X 10.1063/1.1652058 11, 1706 (2004); C. Charles, Phys. Plasmas 12, 044 508 (2005).
3. C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1557319 82, 1356 (2003); C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1643548 84, 332 (2004); C. Charles, Phys. Plasmas 1070-664X 10.1063/1.1652058 11, 1706 (2004); C. Charles, Phys. Plasmas 12, 044 508 (2005).
4. C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1557319 82, 1356 (2003); C. Charles, Appl. Phys. Lett. 0003-6951 10.1063/1.1643548 84, 332 (2004); C. Charles, Phys. Plasmas 1070-664X 10.1063/1.1652058 11, 1706 (2004); C. Charles, Phys. Plasmas 12, 044 508 (2005).
5. S. A. Cohen, N. S. Siefert, S. Stange, R. F. Boivin, E. E. Scime, and F. M. Levinton, Phys. Plasmas 7, 2593 (2003).
6. X. Sun, C. Biloiu, R. Hardin, and E. E. Scime, Plasma Sources Sci. Technol. 13, 359 (2004).
7. A. M. Keesee, E. E. Scime, C. Charles, A. Meige, and R. Boswell, Phys. Plasmas 12, 093 502 (2005).
8. X. Sun, A. M. Keesee, C. Biloiu, E. E. Scime, A. Meige, C. Charles, and R. W. Boswell, Phys. Rev. Lett. 95, 025 004 (2005).
9. F. F. Chen, Introduction to Plasma Physics and Controlled Fusion, 2nd ed. (Plenum, New York, 1984), Vol. 1, p. 292.
10. F. F. Chen and D. Arnush, Phys. Plasmas 8, 5051 (2001).
11. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley-Interscience, Hoboken, NJ, 2005), p. 37.
12. F. F. Chen and J. P. Chang, Principles of Plasma Processing (Plenum-Kluwer-Springer, New York, 2003), p. 72.
13. M. A. Lieberman and A. J. Lichtenberg, in Ref. 9, p. 82.
14. M. M. Balkey, R. Boivin, J. L. Kline, and E. E. Scime, Plasma Sources Sci. Technol. 10, 284 (2001).
15. X. Sun, C. Biloiu, R. Hardin, and E. E. Scime, Plasma Sources Sci. Technol. 13, 359 (2004).