On the role of radicals in kinetics of plasma etchers in Ar/CF4 mixtures

Acta Physica Polonica A

Volumn 115, Issue 4, 2009, Pages 765-767

  Nikitovic Z ^a   Stojanovic V ^a   Petrovic Z L J ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

DISTRIBUTION FUNCTIONS; MIXTURES; PLASMA ETCHING;

DRIFT VELOCITIES; ETCHING SYSTEMS; MEAN ENERGY; MODE OF OPERATIONS; PLASMA CHEMISTRIES; STANDARD PRODUCTS; TRANSPORT COEFFICIENT;

FLUORINE;

EID: 66749112305     PISSN: 05874246     EISSN: 1898794X     Source Type: Journal    
DOI: 10.12693/APhysPolA.115.765     Document Type: Article

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