Effects of Ar dilution on the optical emission spectra of fluorocarbon ultrahigh-frequency plasmas: C4F8 vs CF4

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 3, 1999, Pages 686-691

  Nakano, Toshiki ^a   Samukawa, Seiji ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000137490     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581687     Document Type: Article

References (9)

1. H. Kazumi and K. Tago, Jpn. J. Appl. Phys., Part 1 34, 2125 (1995).
2. C. Suzuki, Y. Kawai, K. Sasaki, and K. Kadota, Proceedings of the 3rd Conference on Reactive Plasmas (The Japan Society of Applied Physics, Nara, Japan, 1997), p. 437.
3. K. Miyata, H. Arai, T. Kuno, M. Hori, and T. Goto, Proceedings of the 3rd Conference on Reactive Plasmas (The Japan Society of Applied Physics, Nara, Japan, 1997), p. 63.
4. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama, and K. Shinohara, Jpn. J. Appl. Phys., Part 1 34, 6805 (1995).
5. H. Itoh et al., J. Phys. D 24, 277 (1991).
6. T. Nakano and H. Sugai, Jpn. J. Appl. Phys., Part 1 31, 2919 (1992).
7. H. Akashi, S. Samukawa, N. Takahashi, and T. Sasaki, Jpn. J. Appl. Phys., Part 2 36, L877 (1997).
8. S. Samukawa and T. Tsukada, Jpn. J. Appl. Phys., Part 1 35, 7647 (1997).
9. M. V. Malyshev, V. M. Donnely, and S. Samukawa, J. Appl. Phys. 84, 1222 (1998).