Self-assembled Gd silicide nanostructures grown on Si(001)

Journal of Applied Physics

Volumn 105, Issue 10, 2009, Pages

  Ye, Gangfeng ^a   Crimp, Martin A ^a   Nogami, Jun ^b  

^a Michigan State University   (United States)

^b UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; FRINGE PATTERN; HEXAGONAL CRYSTAL STRUCTURE; METAL COVERAGES; NANOBEAM ELECTRON DIFFRACTION; NANOSTRUCTURE MORPHOLOGIES; OPTIMUM GROWTH CONDITIONS; PHASE TRANSFORMATION; PREFERENTIAL GROWTH; SCANNED PROBE; SELF-ASSEMBLED; SI(0 0 1);

DIFFRACTION; ELECTRIC WIRE; ELECTRON MICROSCOPES; GADOLINIUM; HOLOGRAPHIC INTERFEROMETRY; LATTICE MISMATCH; MORPHOLOGY; NANOWIRES; SCANNING PROBE MICROSCOPY; SILICIDES; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTAL STRUCTURE;

EID: 66549090779     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3118573     Document Type: Article

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