Two-dimensional photonic crystal color filter development

Optics Express

Volumn 17, Issue 10, 2009, Pages 8621-8629

  Cho, Eun Hyoung ^a   Kim, Hae Sung ^a   Cheong, Byoung Ho ^b   Oleg, Prudnikov ^b   Xianyua, Wenxu ^a   Sohn, Jin Seung ^a   Dong Joon, Ma ^a   Choi, Hwan Young ^b   Park, No Cheol ^c   Park, Young Pil ^c  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BANDPASS FILTERS; COLOR; CRYSTAL FILTERS; DIFFRACTION GRATINGS; EXCIMER LASERS; NANOIMPRINT LITHOGRAPHY; REFLECTION; SILICON; SPONTANEOUS EMISSION; TEMPERATURE;

AMORPHOUS SILICON LAYERS; EXCIMER LASER ANNEALING; INCIDENT ANGLES; LOW TEMPERATURES; ONE DIMENSIONAL PHOTONIC CRYSTAL; SUB-WAVE LENGTH GRATING; TWO-DIMENSIONAL PHOTONIC CRYSTALS; TWO-DIMENSIONAL STRUCTURES;

PHOTONIC CRYSTALS;

EID: 66449093379     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.008621     Document Type: Article

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