Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrates

IEEE Photonics Technology Letters

Volumn 18, Issue 20, 2006, Pages 2126-2128

  Kanamori, Yoshiaki ^a   Shimono, Masaya ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Micromachining; Optical device fabrication; Optical filters; Optical gratings; Periodic structures

Indexed keywords

COLOR; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ETCHING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; QUARTZ; SEMICONDUCTING SILICON; SUBSTRATES;

COLOR FILTERS; FAST ATOM BEAM ETCHING; OPTICAL DEVICE FABRICATION; PERIODIC STRUCTURES; QUARTZ SUBSTRATES; SILICON SUBWAVELENGTH GRATINGS;

OPTICAL FILTERS;

EID: 33750131973     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2006.883208     Document Type: Article

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