One-mode model for patterned metal layers inside integrated color pixels

Optics Letters

Volumn 29, Issue 9, 2004, Pages 974-976

  Catrysse, Peter B ^a   Suh, Wonjoo ^a   Fan, Shanhui ^a   Peeters, Michael ^b  

^a Stanford University   (United States)

^b VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CUTOFF WAVELENGTH; INTEGRATED COLOR PIXELS (ICP); PERFECT ELECTRIC CONDUCTORS (PEC); TRANSVERSE-ELECTRIC (TE) POLARIZATION;

CHARGE COUPLED DEVICES; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DIFFRACTION; ELECTRIC CONDUCTORS; ELECTRICAL ENGINEERING; FINITE DIFFERENCE METHOD; IMAGE SENSORS; LIGHT POLARIZATION; MATHEMATICAL MODELS; OPTICAL FILTERS; OPTIMIZATION; TIME DOMAIN ANALYSIS; WAVEGUIDES;

INTEGRATED OPTICS;

EID: 2442531007     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.29.000974     Document Type: Article

References (13)

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