An investigation of an industrial coating environment with planar probe technology

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 750-755

  Cooke, Kevin E ^a   Goodyear, A ^b   Hampshire, J ^a   Teer, D G ^a  

^a TEER COATINGS LTD   (United Kingdom)

^b OPEN UNIVERSITY   (United Kingdom)

Author keywords

Magnetron; Planar Probe; Pulsed; Sputtering

Indexed keywords

CHARACTERIZATION; DEPOSITION; ELECTRIC POTENTIAL; ELECTROSTATICS; IONS; MAGNETRON SPUTTERING; PLASMAS; PLATING;

CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING ION PLATING (CFUMSIP); ELECTRON DISTRIBUTION; ELECTROSTATIC PROBES; RADIO FREQUENCY (RF);

COATINGS;

COATING; INDUSTRIAL APPLICATION;

EID: 14644420964     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.049     Document Type: Article

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