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Volumn 255, Issue 17, 2009, Pages 7780-7785

Argon-dominated plasma beam generated by filtered vacuum arc and its substrate etching

Author keywords

Ar dominated plasma beam; Carbon vacuum arc; DLC film; Substrate etching; T shape filtered arc deposition (T FAD) system

Indexed keywords

ARGON; DEPOSITION; ETCHING; PASSIVE FILTERS; SILICON WAFERS; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

EID: 66049083195     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.04.170     Document Type: Article
Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.