Investigation of morphology and crystallinity of ZnO crystal formed by side-flow-type MOCVD

Journal of the Electrochemical Society

Volumn 156, Issue 7, 2009, Pages

  Yoshii, Naoki ^a   Nakamura, Atsushi ^b   Hosaka, Shigetoshi ^a   Temmyo, Jiro ^b  

^a TOKYO ELECTRON LTD   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL QUALITIES; CRYSTALLINITY; HIGH GROWTH TEMPERATURES; MOCVD; PROCESS PARAMETERS; ROCKING CURVES; TEMPERATURE CONDITIONS; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION; ZNO; ZNO CRYSTALS; ZNO FILMS; ZNO NANOROD;

CORUNDUM; CRYSTALS; FILM GROWTH; GROWTH TEMPERATURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; NANORODS; ORGANOMETALLICS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 65949099109     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3121225     Document Type: Article

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