Quantitative measurement of outgas products from EUV photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Tarrio, C ^a   Benner, B A ^a   Vest, R E ^a   Grantham, S ^a   Hill, S B ^a   Lucatorto, T B ^a   Hendricks, J H ^a   Abbott, P ^a   Denbeaux, G ^b   Mbanaso, C ^b   Antohe, A ^b   Orvek, K ^c   Choi, K W ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Carbon growth; EUV optics; Extreme ultraviolet lithography; Optics lifetime; Resist outgassing

Indexed keywords

CARBON GROWTH; EUV OPTICS; EXTREME ULTRAVIOLET; OPTICS LIFETIME; RESIST OUTGASSING;

ADSORPTION; CARBONIZATION; DEGASSING; DIAPHRAGMS; EXTREME ULTRAVIOLET LITHOGRAPHY; GAGES; IONIZATION OF GASES; MASS SPECTROMETRY; OPTICS; PHOTORESISTS; VACUUM;

GAS CHROMATOGRAPHY;

EID: 65849084711     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772686     Document Type: Conference Paper

References (7)

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4. J. H. Hendricks, NIST Internal Calibration Report NC214.
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7. C. Tarrio and S. Grantham, "A synchrotron beamline for extreme-ultraviolet multilayer mirror endurance testing, " Rev. Sci. Instrum. 76, 056101 (2005).