Fabrication of well-organized and densely packed Si nanopillars containing SiGe nanodots by using block copolymer templates

Chemistry of Materials

Volumn 20, Issue 19, 2008, Pages 6183-6188

  Aissou, Karim ^a   Baron, Thierry ^a   Kogelschatz, Martin ^a   Hertog, Martien Den ^b   Rouvière, Jean Luc ^b   Hartmann, Jean Michel ^c   Pélissier, Bernard ^a  

^a CNRS   (France)

^b CEA GRENOBLE   (France)

^c DIF   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; FABRICATION; NANODOTS; NANOSTRUCTURES; PLATINUM; SEMICONDUCTOR QUANTUM DOTS; SILICON; SUBSTRATES;

BLOCK COPOLYMER TEMPLATES; DENSE ARRAYS; DOT PATTERNS; HEXAGONAL ARRAYS; ORIENTATIONAL CORRELATIONS; PAIR CORRELATION FUNCTIONS; SI NANOPILLARS; SILICON SUBSTRATES;

SI-GE ALLOYS;

EID: 54849404691     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm800364t     Document Type: Article

References (23)

1. Hirschmann, K. D.; Tsybeskov, L.; Duttagupta, S. P.; Fauchet, P. M. Nature 1996, 384, 338.
2. Ball, P. Nature 2001, 409, 974.
3. Baron, T.; Saminadayar, K.; Magnea, N. Appl. Phys. Lett. 1995, 67, 2972.
4. Abstreiter, G.; Brugger, H.; Wolf, T.; Jorke, H.; Herzog, H. J. Phys. Rev. Lett. 1985, 54, 2441.
5. Apetz, R.; Vescan, L.; Hartmann, A.; Dieker, C.; Lüth, H. Appl. Phys. Lett. 1995, 66, 445.
6. Huang, Z.; Wu, Y.; Fang, H.; Deng, N.; Ren, T.; Zhu, J. Nanotechnology 2006, 17, 1476.
7. Pchelyakov, O. P.; Bolkhovityanov, Y. B.; Dvurechenski, A. V.; Sokolov, L. V.; Nikiforov, A. I.; Yakimov, A. I.; Voigtländer, B. Semiconductors 2000, 34), 1229.
8. Bozzo, S.; Lazzari, J.-L.; Coudreau, C.; Ronda, A.; Arnaud d'Avitaya, F.; Derrien, J.; Mesters, S.; Hollaender, B.; Gergaud, P.; Thomas, O. J. Cryst. Growth 2000, 216, 171.
9. Black, C. T.; Ruiz, R.; Breyta, G.; Cheng, J. Y.; Colburn, M. E.; Guarini, K. W.; Kim, H.-C.; Zhang, Y. IBM J. Res. Dev. 2007, 51, 605.
10. Guarini, K. W.; Black, C. T.; Zhang, Y.; Kim, H.; Sikorski, E. M.; Babich, I. M. J. Vac. Sci. Technol, B 2002, 20, 2788.
11. Mansky, P.; Huang, Y. L.; Russell, T. P.; Hawker, C. Science 1997, 275, 1458.
12. Darling, S. B.; Yufa, N. A.; Cisse, A. L.; Bader, S. D.; Sibener, S. J. Adv. Mater. 2005, 17, 2446.
13. Thurn-Albrecht, T.; Schotter, J.; Kastle, G. A.; Emley, N.; Shibauchi, T.; Krusin-Elbaum, L.; Guarini, K.; Black, C. T.; Tuominen, M. T.; Russell, T. P. Science 2000, 290, 2126.
14. Aissou, K.; Pascale, A.; Kogelschat, M.; Baron, T. Private communication, to be published.
15. Yokoyama, H.; Mates, T. E.; Kramer, E. J. Macromolecules 2000, 33, 1888.
16. In ref 14, we show that the kinetics of vertical cylinder formation is optimal when the film thickness tend to the natural cylinder monolayer thickness.
17. Aissou, K.; Baron, T.; Kogelschatz, M.; Pascale, A. Macromolecules 2007, 40, 5054.
18. Quinn, R. A.; Cui, C.; Goree, J.; Pieper, J. B.; Thomas, H.; Morfill, G. E. Phys. Rev. E 1996, 53, R2049.
19. Vallon, S.; Monget, C.; Joubert, O.; Vallier, L.; Bell, F. H.; Pons, M.; Regolini, J. L.; Morin, C.; Sagnes, I. J. Vac. Sci. Technol., A 1997, 15, 1874.
20. Monget, C.; Vallon, S.; Bell, F. H.; Vallier, L.; Joubert, O. J. Electrochem. Soc. 1997, 144, 2455.
21. Moulder, J. F.; Stickle; W. F., Sobol, P. E.; Bomben, K. D. Handbook of X-ray Photoelectron Spectroscopy; Perkin-Elmer Corp.: Eden Prairie, MN, 1992.
22. Pelissier, B.; Kambara, H.; Godot, E.; Veran, E.; Loup, V.; Joubert, O. Microelectron. Eng. 2008, 85, 151.
23. Rouvière, J. L.; Sarigiannidou, E. Ultramicroscopy 2005, 106, 1.