Electrochemical behavior of boron-doped diamond thin-film electrodes grown on tantalum

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 20, Issue 4, 2009, Pages 479-483

  Gao, Cheng Yao ^a,b   Chang, Ming ^a,b   Li, Xiao Wei ^a,b  

^a TIANJIN UNIVERSITY   (China)

^b TIANJIN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

AC impedance; Boron doped diamond (BDD); Chemical vapor deposition (CVD); Cyclic voltammetry; Electrochemical advanced oxidation process; Electrode material

Indexed keywords

AC IMPEDANCE; BORON DOPED DIAMOND (BDD); BORON-DOPED DIAMOND FILMS; CARBON SOURCES; CHEMICAL OXYGEN DEMAND REMOVALS; CHEMICAL VAPORS; ELECTROCHEMICAL ADVANCED OXIDATION PROCESS; ELECTROCHEMICAL BEHAVIORS; ELECTRODE MATERIAL; ELECTRODE REACTIONS; MASS-TRANSPORT PROCESS; OXYGEN EVOLUTIONS; PH VALUES; REDOX COUPLES; SEM; UV-VISIBLE ABSORPTION SPECTROSCOPIES;

ABSORPTION SPECTROSCOPY; ANODES; ANODIC OXIDATION; BORON; CHEMICAL OXYGEN DEMAND; CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; DIAMOND FILMS; DIAMONDS; ELECTRIC IMPEDANCE; HYDROGEN; OXIDATION RESISTANCE; OXYGEN; PHENOLS; PLATINUM; REMOVAL; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SODIUM; TANTALUM; TRANSITION METALS; VAPORS; WINDOWS;

ELECTROCHEMICAL ELECTRODES;

EID: 65549148275     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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