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Volumn 19, Issue 5, 2008, Pages 625-627

The fabrication of nano-diamond substrate for SAW device in high frequency and power

Author keywords

Microwave plasma chemical vapor deposition; Nano diamond film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MIRRORS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PARTICLE SIZE; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 44849135111     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (12)

References (10)
  • 1
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    • Thermal conductivity of diamond film
    • in Chinese
    • WU Xiao-guo, XIONG Ying, YANG Bao-he, et al. Thermal conductivity of diamond film[J]. Journal of Optoelectronics·Laser, 2007, 18(8): 963-965.(in Chinese)
    • (2007) Journal of Optoelectronics·Laser , vol.18 , Issue.8 , pp. 963-965
    • Wu, X.-G.1    Xiong, Y.2    Yang, B.-H.3
  • 2
    • 1542288009 scopus 로고    scopus 로고
    • Surface acoustic wave devices based on nanocrystalline diamond and aluminium nitride
    • Benedic F. Assouar M B, Mohasseb F, et al. Surface acoustic wave devices based on nanocrystalline diamond and aluminium nitride[J]. Diamond and related materials, 2004, 13: 347-35.
    • (2004) Diamond and Related Materials , vol.13 , pp. 35-347
    • Benedic, F.1    Assouar, M.B.2    Mohasseb, F.3
  • 4
    • 2442449319 scopus 로고    scopus 로고
    • Effects of hydrogen additive on microwave plasma CVD of nanocrystalline diamond in mixtures of argon and methane
    • Liu Y, Liu C, Chen Y, et al. Effects of hydrogen additive on microwave plasma CVD of nanocrystalline diamond in mixtures of argon and methane[J]. Diamond and related materials, 2004, 13: 671-678.
    • (2004) Diamond and Related Materials , vol.13 , pp. 671-678
    • Liu, Y.1    Liu, C.2    Chen, Y.3
  • 6
    • 0035576624 scopus 로고    scopus 로고
    • Modeling the effect ov oxygen on vapor phase diamond deposition inside microtrenches
    • Sally C. Eaton, Mahendra K. Sunkara, Mayumi Ueno, et al. Modeling the effect ov oxygen on vapor phase diamond deposition inside microtrenches[J]. Diamond and related materials, 2001, 10: 2212-2219.
    • (2001) Diamond and Related Materials , vol.10 , pp. 2212-2219
    • Eaton, S.C.1    Sunkara, M.K.2    Ueno, M.3
  • 7
    • 0033609336 scopus 로고    scopus 로고
    • Epitaxial diamond growth on sapphire in an oxidizing environment
    • Mamoru Yoshimoto, Kenji Yoshida, Hideaki Maruta, et al. Epitaxial diamond growth on sapphire in an oxidizing environment[J]. Nature, 1999, 399: 340-342.
    • (1999) Nature , vol.399 , pp. 340-342
    • Yoshimoto, M.1    Yoshida, K.2    Maruta, H.3
  • 8
    • 2442507833 scopus 로고    scopus 로고
    • Consieration of diamond film growth on various oriention substrates of diamond in oxygen and hydrogen atmosphere by reactive pulsed laser deposition
    • Akeshi Hara, Tsuyoushi Yoshitake, Tomohito Fukugawa. Consieration of diamond film growth on various oriention substrates of diamond in oxygen and hydrogen atmosphere by reactive pulsed laser deposition[J]. Diamond and relaed materials, 2004, 13: 622-626.
    • (2004) Diamond and Relaed Materials , vol.13 , pp. 622-626
    • Hara, A.1    Yoshitake, T.2    Fukugawa, T.3
  • 9
    • 7544239897 scopus 로고    scopus 로고
    • Mechancal properties of nanocrystalline diamond/amorphous carbon composite films prepared by microwave plasma chemical vapour deposition
    • Kulischa W, Popovb, B C, Boycheva S, et al. Mechancal properties of nanocrystalline diamond/amorphous carbon composite films prepared by microwave plasma chemical vapour deposition[J], Diamond and Related Materials, 2004, 13: 1997-2002.
    • (2004) Diamond and Related Materials , vol.13 , pp. 1997-2002
    • Kulischa, W.1    Popovb, B.C.2    Boycheva, S.3
  • 10
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    • Ultraviolet raman spectrocopy characterizes chemical vapor deposition diamotmd film growth and bxidation
    • Richard W. Bormett. Sanford A. Asher, Robert E. Witowski, et al. Ultraviolet raman spectrocopy characterizes chemical vapor deposition diamotmd film growth and bxidation[J]. J Appl Phys, 1995, 77(11): 5916-5923.
    • (1995) J Appl Phys , vol.77 , Issue.11 , pp. 5916-5923
    • Bormett, R.W.1    Asher, S.A.2    Witowski, R.E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.