The behaviour of Ti-substrates during deposition of boron doped diamond

International Journal of Refractory Metals and Hard Materials

Volumn 26, Issue 5, 2008, Pages 438-443

  Gerger, Isabella ^a   Haubner, Roland ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Coating; Diamond; Electrodes; Titanium

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; DIAMONDS; DOPING (ADDITIVES); ELECTROCHEMISTRY;

ELECTROCHEMICAL APPLICATIONS; HOT-FILAMENT CVD; SUBSTRATE MATERIALS; TITANIUM SUBSTRATES;

TITANIUM;

EID: 44449121316     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2007.10.002     Document Type: Article

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