Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 976-978

  Hauguth, M ^a   Volland, B E ^a   Ishchuk, V ^a   Dressler, D ^a   Danz, T ^a   Rangelow, I W ^a   Kokkoris, G ^b   Gogolides, E ^b   Goodyear, A ^c   Cooke, M ^c  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^c OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

Plasma etching; Simulation

Indexed keywords

EXPERIMENTAL DATUM; GAS-PHASE; GLOBAL MODELS; MATERIAL SYSTEMS; PLASMA CHEMISTRIES; PLASMA MODELS; PLASMA PROCESSING; REACTOR SIMULATIONS; SIMULATION; SIMULATION FRAMEWORKS; SOFTWARE PLUG-INS; SURFACE REACTION MODELS;

CHEMISTRY; COMPUTER SOFTWARE; GAS DYNAMICS; GASES; INDUCTIVELY COUPLED PLASMA; ORGANIC POLYMERS; PLASMA ETCHING; REACTION KINETICS; SILICON COMPOUNDS; SURFACES; SWITCHING; TWO DIMENSIONAL;

SURFACE REACTIONS;

EID: 65549108193     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.02.012     Document Type: Article

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