New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 982-984

  Hauguth, M ^a   Danz, T ^a   Volland, B E ^a   Ishshuk, V ^a   Dressler D ^a   Rangelow, I W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Etching; Finite elements; Flux calculation; Simulation

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; PARAMETER ESTIMATION;

FLUX CALCULATION; NEUTRAL SPECIES;

ETCHING;

EID: 44149090564     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.019     Document Type: Article

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