Design, fabrication, and characterization of an ultracompact low-loss photonic crystal corner mirror

IEEE Journal of Quantum Electronics

Volumn 43, Issue 10, 2007, Pages 876-883

  Yu, Hejun ^a   Yu, Jinzhong ^a   Yu, Yude ^a   Fan, Zhong Chao ^a   Chen, Shaowu ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Corner mirror; Electron beam lithography (EBL); Photonic crystal (PC); Reflector; Silicon on insulator (SOI)

Indexed keywords

BROAD BANDS; CORNER MIRROR; ELECTRON-BEAM LITHOGRAPHY (EBL); ELECTRONIC POLARIZATIONS; FINITE DIFFERENCE TIME-DOMAIN METHODS; LOSS MECHANISMS; LOW LOSS; OPTIMIZED STRUCTURES; REFLECTOR; SILICON-ON-INSULATOR (SOI); SILICON-ON-INSULATOR SUBSTRATES; TRANSMISSION CHARACTERISTICS; WAVELENGTH RANGES;

CRYSTAL ATOMIC STRUCTURE; ELECTRON BEAM LITHOGRAPHY; INDUCTIVELY COUPLED PLASMA; METHOD OF MOMENTS; MICROSENSORS; MIRRORS; PLASMA ETCHING; REFLECTION; SILICON ON INSULATOR TECHNOLOGY; TIME DOMAIN ANALYSIS;

PHOTONIC CRYSTALS;

EID: 65349110844     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2007.904307     Document Type: Article

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