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Volumn 113, Issue 10, 2009, Pages 4184-4187

Dip-pen nanolithography-generated patterns used as gold etch resists: A comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol

Author keywords

[No Author keywords available]

Indexed keywords

1-OCTADECANETHIOL; AFM; ALKANE-THIOLS; COMPARISON STUDIES; DIP-PEN NANOLITHOGRAPHIES; DOT PATTERNS; ETCH RESISTS; MORPHOLOGY CHANGES; SAMS; TAPPING MODES; WET-CHEMICAL ETCHINGS;

EID: 65249143344     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp810746j     Document Type: Article
Times cited : (21)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.