Dewetting of an organic semiconductor thin film observed in real-time

Advanced Engineering Materials

Volumn 11, Issue 4, 2009, Pages 291-294

  Kowarik, Stefan ^a,c   Gerlach, Alexander ^a   Sellner, Stefan ^a   Cavalcanti, Leide ^b   Schreiber, Frank ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; BI LAYERS; BRAGG REFLECTIONS; DE-WETTING; GROWTH CHAMBERS; ISOPROPANOL; MOLECULAR MONOLAYERS; NATIVE OXIDES; ORGANIC MOLECULAR-BEAM DEPOSITIONS; ORGANIC SEMICONDUCTOR THIN FILMS; ROOM TEMPERATURES; SECOND ORDERS; SI(1 0 0 ); TIME-SCALE; ULTRA-PURE WATERS; X -RAY MEASUREMENTS;

ACETONE; CHEMICAL MODIFICATION; LASER OPTICS; MOLECULAR DYNAMICS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON WAFERS; ULTRAHIGH VACUUM;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 64749083601     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200800289     Document Type: Article

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