Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3578-3580

  Munoz D ^a   Carreras, P ^a   Escarre J ^a   Ibarz, D ^a   Martin de Nicolas S ^b   Voz, C ^b   Asensi, J M ^a   Bertomeu, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

Author keywords

c Si texturing; Heterojunctions; Hot wire CVD; Solar cells

Indexed keywords

C-SI TEXTURING; EFFECTIVE LIFETIMES; ETCHING CONDITIONS; FLAT SUBSTRATES; HETEROJUNCTION SOLAR CELLS; HOT-WIRE CVD; KOH ETCHINGS; LOW CONCENTRATIONS; OPEN CIRCUITS; OPEN-CIRCUIT VOLTAGES; POTASSIUM HYDROXIDE SOLUTIONS; PYRAMIDAL STRUCTURES; QUASI-STEADY-STATE PHOTOCONDUCTANCE; SI WAFERS; TEXTURED SUBSTRATES; TEXTURIZATION;

CHEMICAL VAPOR DEPOSITION; ETCHING; HETEROJUNCTIONS; OPTICAL PROPERTIES; PASSIVATION; PHOTOVOLTAIC CELLS; POTASSIUM; POTASSIUM HYDROXIDE; SILICON; SILICON WAFERS; SOLAR CELLS; SUBSTRATES; TEXTURING; WIRE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 64649083109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.024     Document Type: Article

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