Analysis of drying shrinkage and flow due to surface tension of spin-coated films on topographic substrates

IEEE Transactions on Semiconductor Manufacturing

Volumn 10, Issue 4, 1997, Pages 438-444

  Hirasawa, Shigeki ^a   Saito, Yoko ^a   Nezu, Hiroki ^a   Ohashi, Naofumi ^a   Maruyama, Hiroyuki ^a  

^a HITACHI LTD   (Japan)

Author keywords

Evaporative shrinkage; Grooved substrate; Planarization; SOG film; Spin coating; Surface tension flow

Indexed keywords

APPROXIMATION THEORY; DIFFERENTIAL EQUATIONS; EVAPORATION; ITERATIVE METHODS; SHRINKAGE; SUBSTRATES; SURFACE TENSION; THIN FILMS; VISCOSITY;

SPIN ON GLASS (SOG) FILMS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031276073     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.641486     Document Type: Article

References (8)

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