Low temperature (< 100 °C) fabrication of thin film silicon solar cells by HWCVD

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 751-754

  Rath, J K ^a   de Jong, M ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Amorphous silicon; Hot wire CVD; Solar cell; Structural order

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE EFFECTS; PHOTOSENSITIVITY; THIN FILMS;

HOT-WIRE CVD; STRUCTURAL ORDER; SUBSTRATE HEATING;

SOLAR CELLS;

EID: 36749050883     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.059     Document Type: Article

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