Tantalum zone plates for scanning X-ray microscopy between 0.5 and 2.5 keV

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5539, Issue , 2004, Pages 195-199

  Weitkamp, Timm ^a   Dhez, Olivier ^b   Kaulich, Burkhard ^c   David, Christian ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c SINCROTRONE TRIESTE   (Italy)

Author keywords

Electron beam lithography; Synchrotron radiation; Tantalum; X ray microscopy; X ray optics; Zone plate

Indexed keywords

DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; ETCHING; MAGNETRON SPUTTERING; NANOTECHNOLOGY; SCANNING; SYNCHROTRON RADIATION; TANTALUM; X RAY OPTICS;

NITRIDE MEMBRANES; SILICON NITRIDE MEMBRANES; TANTALUM FILMS; ZONE PLATES;

X RAY MICROSCOPES;

EID: 15844406183     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.559704     Document Type: Conference Paper

References (11)

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