Low-energy electron-induced chemistry of condensed-phase hexamethyldisiloxane: Initiating dissociative process and subsequent reactions

International Journal of Mass Spectrometry

Volumn 282, Issue 3, 2009, Pages 133-140

  Ipolyi, I ^a   Burean, E ^a   Hamann, T ^a   Cingel, M ^b   Matejcik, S ^b   Swiderek, P ^a  

^a UNIVERSITY OF BREMEN   (Germany)

^b Faculty of Natural Sciences   (Slovakia)

Author keywords

Dissociative electron attachment; Electron induced reactions siloxanes; Thermal desorption spectrometry

Indexed keywords

EID: 64049110991     PISSN: 13873806     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijms.2009.02.020     Document Type: Article

References (31)

1. Geyer W., Stadler V., Eck W., Zharnikov M., Gölzhäuser A., and Grunze W. Appl. Phys. Lett. 75 (1999) 2401
2. Eck W., Stadler V., Geyer W., Zharnikov M., Gölzhäuser A., and Grunze M. Adv. Mater. 12 (2000) 805
3. Di W., Rowntree P., and Sanche L. Phys. Rev. B 52 (1995) 16618
4. Lafosse A., Bertin M., Caceres D., Jäggle C., Swiderek P., Pliszka D., and Azria R. Eur. Phys. J. D 35 (2005) 363
5. Abdoul-Carime H., Gohlke S., and Illenberger E. Phys. Rev. Lett. 92 (2004) 168103
6. Ptasińska S., Denifl S., Grill V., Märk T.D., Scheier P., Gohlke S., Huels M.A., and Illenberger E. Angew. Chem. Int. Ed. 44 (2005) 1647
7. Ptasińska S., Denifl S., Grill V., Märk T.D., Illenberger E., and Scheier P. Phys. Rev. Lett. 95 (2005) 093201
8. Ptasińska S., Denifl S., Scheier P., Illenberger E., and Märk T.D. Angew. Chem. Int. Ed. 44 (2005) 6941
9. Magni D., Deschenaux C., Hollenstein C., Creatore A., and Fayet P. J. Phys. D 34 (2001) 87
10. Raynaud P., Despax B., Segui Y., and Caquineau H. Plasma Process. Polym. 2 (2005) 45
11. Rau C., and Kulisch W. Thin Solid Films 249 (1994) 28
12. Li K., Gabriel O., and Meichsner J. J. Phys. D 37 (2004) 588
13. Benítez F., Martínez E., and Esteve J. Thin Solid Films 377-378 (2000) 109
14. Alexander M.R., Jones F.R., and Short R.D. Plasma Polym. 2 (1997) 277
15. Jiao C.Q., De Joseph C.A., and Garscadden A. J. Vac. Sci. Technol. A 23 (2005) 1295
16. Kurunczi P., Koharian A., Becker K., and Martus K. Contr. Plasma Phys. 36 (1996) 723
17. Kurunczi P., Becker K., and Martus K. Can. J. Phys. 76 (1998) 153
18. Danelon C., Santschi C., Brugger J., and Vogel H. Langmuir 22 (2006) 10711
19. Ipolyi I., and Swiderek P. Surf. Sci. 602 (2008) 3199
20. Ipolyi I., Michaelis W., and Swiderek P. Phys. Chem. Chem. Phys. 8 (2007) 182
21. Matejcik S., Ipolyi I., and Illenberger E. Chem. Phys. Lett. 375 (2003) 660
22. Carles S., Le Garrec J.L., and Mitchell J.B.A. J. Chem. Phys. 127 (2007) 144308
23. Burean E., Ipolyi I., Hamann T., and Swiderek P. Int. J. Mass Spectrom. 277 (2008) 215
24. NIST Chemistry Web Book, NIST Standard Reference Database Number 69, Eds. P.J. Linstrom and W.G. Mallard, June 2005, National Institute of Standards and Technology, Gaithersburg, MD, 20899 (http://webbook.nist.gov).
25. Burean E., and Swiderek P. Surf. Sci. 602 (2008) 3194
26. Basner R., Foest R., Schmidt M., Sigeneger F., Kurunczi P., Becker K., and Deutsch H. Int. J. Mass Spectrom. Ion Proc. 153 (1996) 65
27. Basner R., Foest R., Schmidt M., Becker K., and Deutsch H. Int. J. Mass Spectrom. 176 (1998) 245
28. Wrobel A.M., Kryszewski M., and Gazicki M. J. Macromol. Sci. A 20 (1983) 583
29. Embery C.J., Matisons J.G., and Clarke S.R. Synthesis and properties of silicones and silicone-modified materials. In: Clarson S.J., Fitzgerald J.J., Owen M.J., Smith S.D., and van Dyke M.E. (Eds). ACS Symposium Series (2003) 26
30. Rowntree P., Parenteau L., and Sanche L. J. Phys. Chem. 95 (1991) 4902
31. Olsen C., and Rowntree P. J. Chem. Phys. 108 (1998) 3750