Electron impact ionization of tetramethylsilane (TMS)

International Journal of Mass Spectrometry and Ion Processes

Volumn 153, Issue 1, 1996, Pages 65-78

  Basner, R ^a   Foest, R ^a   Schmidt, M ^a   Sigeneger, F ^a   Kurunczi, P ^a,b   Becker, K ^a,b   Deutsch, H ^a,c  

^a Inst F Niedertemperatur P   (Germany)

^b CITY COLLEGE OF NEW YORK   (United States)

^c EMA Universität   (Germany)

Author keywords

Cross sections; Electron impact ionization; Plasma deposition

Indexed keywords

EID: 0038775820     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-1176(95)04352-7     Document Type: Article

References (41)

1. R. d'Agostino (Ed.), Plasma Deposition, Treatment and Etching of Polymers, Academic Press, San Diego, 1990.
2. H. Yasuda, Plasma Polymerization, Academic Press, London, 1985.
3. A.W. Luft and S. Tsuo, Appl. Phys. Commun., 8 (1988) 1.
4. D.A. Gougherty and A. Gallagher, J. Appl. Phys., 67 (1990) 139.
5. A.M. Wrobel, M. Kryszewski and M. Gazicki, J. Macromol. Sci. Chem. A, 201 (1983) 583.
6. I. Tajama and M. Yamamoto, J. Polym. Sci.: Part A Polym. Chem., 25 (1987) 1737.
7. P. Favia, R. Lamendola and R. d'Agostino, Plasma Sources Sci. Technol., 1 (1992) 59.
8. S. Peter, R. Pintaske, G. Hecht and F. Richter, Surf. Coat. Technol., 59 (1993) 97.
9. M. Schmidt, R. Foest, R. Basner and M. Hannemann, Acta Phys. Univ. Comenianae, 35 (1994) 217.
10. R. Jurani, R. Lamendola, R. di'Agostino and J. Trnovec, in P. Lukac (Ed.), Contributed Papers 10th Symposium on Elementary Processes and Chemical Reactions in Low-Temperature Plasma, Stara Lesna, Slovakia, Comenius University, Bratislava, 1994, p. 28.
11. K. Becker and V. Tarnovsky, Plasma Sources Sci. Technol., 4 (1995) 307.
12. K. Becker, Comm. At. Mol. Phys., 30 (1994) 261.
13. S. McGinnis, K. Riehl and P.D. Haaland, Chem. Phys. Lett., 232 (1995) 99.
14. P. Potzinger and F.W. Lampe, J. Phys. Chem., 74 (1970) 719.
15. G. Distefano, Inorg. Chem., 9 (1970) 1919.
16. Eight Peak Index of Mass Spectra, 2nd edn., Mass Spectrometry Data Centre, Aldermaston, 1974; NIST/EPA/NIH Mass Spectral Data Base, Vol. 4.5; Chemical Concepts, P.O. Box 100 202 D-62442 Weinheim, 1994.
17. Eight Peak Index of Mass Spectra, 2nd edn., Mass Spectrometry Data Centre, Aldermaston, 1974; NIST/EPA/NIH Mass Spectral Data Base, Vol. 4.5; Chemical Concepts, P.O. Box 100 202 D-62442 Weinheim, 1994.
18. M. Ducrepin, J. Dike, R.B. Siegel, V. Tarnovsky and K. Becker, J. Appl. Phys., 73 (1993) 7203.
19. (a) P. Kurunczi, J.P. Michel, N. Abramzon, K.E. Martus and K. Becker, in K.H. Becker, W.E. Carr and E.E. Kunhardt (Eds.), Contributed papers XXII International Conference on Phenomena in Ionized Gases (ICPIG), Hoboken, NJ, USA, 1995, Stevens Institute of Technology Press, 1995, pp. 2-183.
20. (b) P. Kurunczi, J.P. Michel, N. Abramzon, A. Koharian, K.E. Martus and K. Becker, Contr. Plasma Phys., submitted for publication.
21. R. Basner, M. Schmidt, H. Deutsch, V. Tarnovsky, A. Levin and K. Becker, J. Chem. Phys., 103 (1995) 211.
22. R. Basner, M. Schmidt and H. Deutsch, Contr. Plasma Phys., 35 (1995) 375.
23. K. Stephan, H. Helm and T.D. Märk, J. Chem. Phys., 73 (1980) 3763.
24. D. Margreiter, G. Waldner, H. Deutsch, H.U. Poll, C. Winkler, K. Stephan and T.D. Märk, Int. J. Mass Spectrom. Ion Processes, 100 (1990) 143.
25. H.U. Poll, C. Winkler, V. Grill, D. Margreiter and T.D. Märk, Int. J. Mass Spectrom. Ion Processes, 112 (1992) 1.
26. V. Tarnovsky, A. Levin, K. Becker, R. Basner and M. Schmidt, Int. J. Mass Spectrom. Ion Processes, 133 (1994) 175.
27. SIMION, Version 5.0, Idaho National Engineering Laboratory, EG&E Idaho, Inc., Idaho Falls, ID, 1992.
28. D. Rapp and P. Englander-Golden, J. Chem. Phys., 43 (1965) 5.
29. A.F. Hollemann and E. Wiberg, Lehrbuch der Anorganischen Chemie, Walter de Gruyter, Berlin, 1985.
30. W.H. Press, S.A. Teukolsky, W.T. Vetterling and B.P. Flannery, Numerical Recipes in C. Cambridge University Press, Cambridge, 1992.
31. H. Deutsch, T.D. Märk, V. Tarnovsky, K. Becker, C. Cornelissen, L. Cespiva and V. Bonacic-Koutecky, Int. J. Mass Spectrom. Ion Processes, 137 (1994) 77.
32. W.L. Fitch and A.D. Sauter, Anal. Chem., 5 (1983) 832.
33. H. Deutsch and M. Schmidt, Contrib. Plasma Phys., 25 (1985) 475.
34. R. Basner, M. Schmidt, H. Deutsch, V. Tarnovksy, A. Levin and K. Becker, J. Chem Phys., 103 (1995) 211.
35. V. Tarnovsky, A. Levin, H. Deutsch and K. Becker, J. Chem. Phys., 102 (1995) 770.
36. V. Tarnovsky, A. Levin, H. Deutsch and K. Becker, J. Phys. B, in press.
37. W.L. Fite and R.T. Brackmann, Phys. Rev., 112 (1958) 1141.
38. E. Brook, M.F.A. Harrison and A.C.H. Smith, J. Phys. B, 11 (1978) 3115.
39. R.S. Freund, R.C. Wetzel, R.J. Shul and T.R. Hayes, Phys. Rev. A, 41 (1990) 3575.
40. M. Gryzinski, Phys. Rev., 138 (1965) 305, 322, 336.
41. T.A. Daniels, H. Zhu, M.P. Banjaycic and K.T. Leung, Chem. Phys., 159 (1992) 289.