Sputter-deposited Mg-Al-O thin films: Linking molecular dynamics simulations to experiments

Journal of Physics D: Applied Physics

Volumn 42, Issue 6, 2009, Pages

  Georgieva, V ^a   Saraiva, M ^b   Jehanathan, N ^a   Lebelev, O I ^a   Depla, D ^b   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTALLINE MATERIALS; DISTRIBUTION FUNCTIONS; DYNAMICS; ELECTRODEPOSITION; MAGNETRONS; MOLECULAR DYNAMICS; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SUBSTRATES; CRYSTALLINE-TO-AMORPHOUS; CRYSTALLINITY; DUAL MAGNETRONS; IN-BETWEEN; METAL CONTENTS; MG CONCENTRATIONS; MGO FILMS; MOLECULAR DYNAMICS SIMULATIONS; MOLECULAR-DYNAMICS MODELS; OPERATING CONDITIONS; RADIAL DISTRIBUTION FUNCTIONS; TRANSMISSION ELECTRONS; X- RAY DIFFRACTIONS;

AMORPHOUS FILMS;

EID: 63649106481     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/6/065107     Document Type: Article

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