Plasma etching for industrial in-line processing of c-Si solar cells

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1376-1379

  Rentsch, J ^a   Emanuel, G ^a   Schetter, C ^a   Aumann, T ^b   Theirich, D ^b   Gentischer, J ^c   Roth, K ^d   Fritzsche, M ^d   Dittrich, K H ^d   Preu, R ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b Fmt   (Germany)

^c ACR GmbH   (Germany)

^d Roth and Rau AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BREAKAGE LOSSES; IN-LINE PRODUCTION SYSTEMS; PHOSPHORUS SILICATE GLASS (PSG); SILICON BULKS;

DEPOSITION; ELECTRON CYCLOTRON RESONANCE; PLASMA ETCHING; REDUCTION; SILICON NITRIDE; SILICON WAFERS;

SOLAR CELLS;

EID: 6344287854     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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