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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 8, 2004, Pages 2027-2031

Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

(5) Lee, C H a Chang, T W b Lee, K L a Lin, J Y b Wang, J c,d

a ACADEMIA SINICA (Taiwan)

b NATIONAL CHUNG CHENG UNIVERSITY (Taiwan)

c INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES (Taiwan)

d NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LASER BEAMS; LIGHT POLARIZATION; LIGHT REFLECTION; PHOTONS; PHOTOPOLYMERIZATION; PHOTORESISTS; REACTIVE ION ETCHING; SAPPHIRE; STRENGTH OF MATERIALS;

HYBRID POLYMERS; OPTICAL PULSES; TWO-PHOTON ABSORBTION;

SILICON;

EID: 6344267073 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-003-2423-y Document Type: Article

Times cited : (31)

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