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Journal of the Korean Physical Society

Volumn 45, Issue 3, 2004, Pages 693-696

Dielectric properties of Bi3.25Nd0.75Ti 3O12 thin film

(3) Jang, Guneik a Kim, Kibeom a Yoon, Daeho b

a Chungbuk National University (South Korea)

b Sungkyunkwan University (South Korea)

Author keywords

Bi4 xNdxTi3O 12 thin films; Fatigue; Ferroelectric properties; FRAM; MOD method

Indexed keywords

EID: 6344244519 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Conference Paper

Times cited : (4)

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