Low-K carbon films deposited in low frequency discharge for sub-micron devices

2003 Nanotechnology Conference and Trade Show - Nanotech 2003

Volumn 3, Issue , 2003, Pages 29-32

  Kosarev, A ^a   Torres, A ^a   Zuniga, C ^a  

^a Astrophysics Optics and Electronics National Institute   (Mexico)

Author keywords

Carbon films; Low K materials; Plasma deposition

Indexed keywords

CARBON; ELECTRIC BREAKDOWN; ELECTRIC RESISTANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTEGRATED CIRCUITS; MICROSTRUCTURE; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA;

CARBON FILMS; LOW-K MATERIALS; PLASMA DEPOSITION; RF PLASMA;

THIN FILMS;

EID: 6344226189     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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