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Volumn 311, Issue 7, 2009, Pages 1893-1896

High detectivity AlGaAsSb/InGaAsSb photodetectors grown by molecular beam epitaxy with cutoff wavelength up to 2.6 μm

Author keywords

A3. Molecular beam epitaxy; B1. Antimonides; B2. Semiconducting III V materials; B3. Heterojunction semiconductor devices; B3. Infrared devices

Indexed keywords

CRACKING (CHEMICAL); CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY; GALLIUM ALLOYS; HETEROJUNCTION BIPOLAR TRANSISTORS; INFRARED DEVICES; IONIZATION OF GASES; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; OPTOELECTRONIC DEVICES; PHOTODETECTORS; PHOTOLITHOGRAPHY; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR QUANTUM WIRES; SEMICONDUCTOR SWITCHES;

EID: 63349085821     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.12.009     Document Type: Article
Times cited : (18)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.