Crystallinity and internal strain of one-dimensionally long Si grains by CW laser lateral crystallization

ECS Transactions

Volumn 16, Issue 9, 2009, Pages 145-151

  Fujii, Shuntaro ^a   Kuroki, Shin Ichiro ^a   Zhu, Xiaoli ^a   Numata, Masayuki ^a   Kotani, Koji ^a   Ito, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS WAVE LASERS; CRYSTALLINITY; GRAIN BOUNDARIES; GRAIN GROWTH; SILICA; SILICON; SILICON OXIDES; TENSILE STRAIN; THERMAL EXPANSION; THIN FILM CIRCUITS; THIN FILM TRANSISTORS;

CONTINUOUS WAVES; CW LASER LATERAL CRYSTALLIZATIONS; GROWTH DIRECTIONS; IN-PLANE DIRECTION; INTERNAL STRAINS; POLY-SI THIN FILM; SINGLE-CRYSTALLINE; THERMAL EXPANSION COEFFICIENTS;

THIN FILMS;

EID: 63149171304     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2980543     Document Type: Conference Paper

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