Remote plasma and thermal ALD of platinum and platinum oxide films

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 209-218

  Knoops, H C M ^a,b   Mackus, A J M ^b   Donders, M E ^a,b   Van De Sanden, M C M ^b   Notten, P H L ^b,c   Kessels, W M M ^b  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; ENERGY GAP; OXIDE FILMS;

LOW RESISTIVITY; PLASMA EXPOSURE; PLATINUM FILMS; PLATINUM OXIDE; PROCESS DEPENDENCE; SUBSTRATE TEMPERATURE; TEMPERATURE WINDOW; THERMAL PROCESS;

PLATINUM COMPOUNDS;

EID: 63149135497     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2979996     Document Type: Conference Paper

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