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Volumn 151, Issue 1, 2009, Pages 77-80
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Anodic bonding of glasses with interlayers for fully transparent device applications
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Author keywords
Anodic bonding; Field assisted sealing; Multilayer structure; Thin film
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Indexed keywords
APPLICATIONS;
COMPOSITE FILMS;
ELECTRIC RESISTANCE;
FILM PREPARATION;
GLASS;
MULTILAYERS;
SEMICONDUCTING FILMS;
THIN FILM DEVICES;
TITANIUM;
VACUUM;
VACUUM DEPOSITION;
ANODIC BONDING;
BONDING TEMPERATURES;
BONDING TIME;
CONDUCTIVE INTERLAYERS;
DEVICE APPLICATIONS;
ELECTRICAL RESISTIVITIES;
FIELD ASSISTED SEALING;
GLASS PLATES;
HIGHER DEGREES;
MULTILAYER STRUCTURE;
OPTICAL TRANSMITTANCES;
OPTIMAL CONDITIONS;
PRE-HEATING TIME;
THERMAL PROCESSING;
THIN-FILM DEPOSITIONS;
TI FILMS;
TI THIN FILMS;
TITANIUM THIN FILMS;
GLASS BONDING;
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EID: 63049096799
PISSN: 09244247
EISSN: None
Source Type: Journal
DOI: 10.1016/j.sna.2009.01.018 Document Type: Article |
Times cited : (16)
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References (9)
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