Mechanical property evaluation of ZnO thin films using nanoindentation and scanning probe microscope

Advanced Materials Research

Volumn 55-57, Issue , 2008, Pages 609-612

  Fang, T H ^a   Kang, S H ^a  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

Indentation Size Effect; Nanofriction; Nanoindentation; Tribology; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; FRICTION; FUNCTIONAL MATERIALS; HARDNESS; II-VI SEMICONDUCTORS; INDENTATION; INTELLIGENT MATERIALS; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; NANOINDENTATION; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; SCANNING PROBE MICROSCOPY; SILICON COMPOUNDS; TRIBOLOGY; ZINC OXIDE;

ATOMIC FORCE MICROSCOPY/FRICTION FORCE MICROSCOPIES; BERKOVICH INDENTERS; INDENTATION SIZE EFFECTS; MECHANICAL PROPERTY EVALUATION; NANO-INDENTATION MEASUREMENTS; NANOFRICTION; NANOTRIBOLOGICAL PROPERTIES; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM;

THIN FILMS;

EID: 62949220246     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/amr.55-57.609     Document Type: Conference Paper

References (17)

1. P. Sharma, S. Kumar and K. Sreenivas: J. Mater. Res. Vol. 18 (2003), p. 545.
2. K.H. Kim, K.C. Park and T.Y. Ma: J. Appl. Phys. Vol. 81 (1997), p. 7764.
3. T.H. Fang, W.J. Chang and C.M. Lin: Mater. Sci. Eng., A. Vol. 452-453 (2007), p. 715.
4. R. Bahl, A. Kumar, M. Vedawyas and D. Patel: Appl. Phys., A. Vol. 69 (1999), p. S643.
5. M.J. Mayo, R.W. Siegel, Y.X. Liao and W.D. Nix: J. Mater. Res. Vol. 7 (1992), p. 973.
6. D.A. Lucca, M.J. Klopfstein, R. Ghisleni and G. Cantwell: Ann. CIRP. Vol. 51 (2002), p. 483.
7. M.J. Klopfstein, D.A. Lucca and G. Cantwell: Phys. Status Solidi., A. Vol. 196 (2003), p. Rl.
8. M. Fujita, N. Kawamoto, T. Tatsumi, K. Yamagishi and Y. Horikoshi: Jpn. J. Appl. Phys. Vol. 42 (2003), p. 67.
9. K. Haga, T. Suzuki, Y. Kashiwaba, H. Watanabe, B.P. Zhang and Y. Segawa: Thin Solid Films Vol. 433 (2003), p. 131.
10. N. Audebrand, J.P. Auffredic and D. Louer: Chem. Mater. Vol. 10 (1998), p. 2450.
11. J.H. Lee, K.H. Ko and B.O. Park: J. Crystal Growth. Vol. 247 (2003), p. 119.
12. X. Jiang, F.L. Wong, M.K. Fung and S.T. Lee: Appl. Phys. Lett. Vol. 83 (2003), p. 1875.
13. T.H. Fang and W.J. Chang: Microelectron. J. Vol. 35 (2004), p. 595.
14. T.H. Fang, C.I. Weng, J.G. Chang and C.C. Hwang: Thin Solid Films. Vol. 396 (2001), . 166.
15. X.Q. Wei, Z.G. Zhang, M. Liu, C.S. Chen, G. Sun, C.S. Xue, H.Z. Zhuang and B.Y. Man: ater. Chem. Phys. Vol. 101 (2007), p. 285.
16. I.W. Kim, S.J. Doh, C.C. Kim, J.H.O. Je, J. Tashiro and M. Yoshimoto: Appl. Surf. Sci. Vol. 41 (2005), p. 179.
17. T.H. Fang, C.I. Weng and J.G. Chang: Nanotechnology. Vol. 11 (2000), p. 181.