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Volumn 45, Issue 4-5, 2009, Pages 277-284
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Compositional analysis and evolution of defects formed on GaInP epilayers grown on Germanium
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Author keywords
Crystalographic defects; Germanium; III V semiconductors
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEFECTS;
GERMANIUM;
III-V SEMICONDUCTORS;
INDIUM ALLOYS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR ALLOYS;
SEMICONDUCTOR QUANTUM WELLS;
SUBSTRATES;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
COMPOSITIONAL ANALYSIS;
EPILAYERS GROWN;
HIGH RESOLUTION X RAY DIFFRACTION;
LAYER COMPOSITION;
MORPHOLOGICAL STUDY;
NUCLEATION LAYERS;
RUTHERFORD BACKSCATTERING CHANNELING;
TRUNCATED PYRAMIDS;
GALLIUM ALLOYS;
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EID: 62949092695
PISSN: 07496036
EISSN: 10963677
Source Type: Journal
DOI: 10.1016/j.spmi.2008.12.013 Document Type: Article |
Times cited : (13)
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References (9)
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