70nm DRAM intra-field CDU improvement by dose modulation on mask transmittance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Chin, Tomas ^a   Wu, Wen Bin ^a   Shih, Chiang Lin ^a   Fan, Pei Cheng ^a   Zvi, Guy Ben ^b  

^a NANYA TECHNOLOGY CORPORATION   (Taiwan)

^b Pixer Technology Ltd   (Ireland)

Author keywords

CD calibration; CD correction; CDC ratio; Intra field; Multi field CD correlation; Systematic CDU error

Indexed keywords

CD CALIBRATION; CD CORRECTION; CDC RATIO; INTRA-FIELD; MULTI-FIELD CD CORRELATION; SYSTEMATIC CDU ERROR;

CALIBRATION; DYNAMIC RANDOM ACCESS STORAGE; ERROR CORRECTION; MODULATION; OXIDE MINERALS; QUARTZ;

DATA STORAGE EQUIPMENT;

EID: 62649170596     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801417     Document Type: Conference Paper

References (5)

1. Rainer Pforr, Mario Henning, Jens Reichelt, Guy Ben Zvi, Martin Sczyrba, " Performance comparison of techniques for intra-field CD control improvement", Proc, SPIE 6730-32 (2007).
2. Yasutake Morikawa, Takanori Sutou, Yuichi Inazuki, Takashi Adachi, Yuuichi Yoshida, Kouichirou Kojima, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, "In-field CD uniformity control by altering transmission distribution of the photomask, using Ultra fast pulsed laser technology", Proc. SPIE 6283-1 (2006).
3. Eitan Zait, Guy Ben-Zvi, Vladimir Dmitriev, Sergey Oshemkov, Rainer Pforr, Mario Hennig, "Irradiation Resistance of Intravolume Shading Elements embedded in Photomasks used for CD Uniformity Control by Local Intra-field Transmission Attenuation", Proc. SPIE 6283-11 (2006).
4. Guy Ben-Zvi, Eitan Zait, "Introduction to Mask and Wafer Intrafield Critical Dimension Control (CDC) using Ultrafast Laser", SEMICON Japan (2006).
5. Eitan Zait, Vladimir Dmitrive, Sergey Oshemkov, Guy Ben-Zvi, Dany Michaelis, "CD Variations Correction by Local Transmission Control of Photomasks Done with a Novel Laser based Process", Proc. SPIE Vol.6152 (2006).