Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Zait, Eitan ^a   Ben Zvi, Guy ^a   Dmitriev, Vladimir ^a   Oshemkov, Sergey ^a   Pforr, Rainer ^b   Hennig, Mario ^b  

^a UCLT Ltd   (Israel)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; EMBEDDED SYSTEMS; ERROR ANALYSIS; EXCIMER LASERS; OPTICAL RESOLVING POWER; SILICON WAFERS;

IRRADIATION RESISTANCE; LOCAL INTRA-FIELD TRANSMISSION ATTENUATION; PHOTOMASKS;

IRRADIATION;

EID: 33748080792     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681741     Document Type: Conference Paper

References (5)

1. Jong R. Park et al, "Improvement of Shot Uniformity on a Wafer by Controlling Backside Transmittance distribution of a Photomask" Optical Microlithography XVI. Proceedings of the SPIE, Volume 5040, pp. 553-560 (2003).
2. E. Zait et al; "CD Variations Correction by Local Transmission Control of Photomasks done with a Novel Laser based Process" SPIE proc. 6152-76 (Feb. 2006).
3. E.N. Glezer and E. Mazur; "Ultrafast-laser driven micro-explosions in transparent materials", Appl. Phys. Lett., Vol. 71, p. 882 (1997).
4. C.Schaffer, A. Jamison and E. Mazur; "Morphology of femtosecond laser-induced structural changes in bulk transparent materials", Appl. Phys. Lett., Vol. 84, p. 1441-1443 (2004).
5. R.W. Boyd, Nonlinear Optics, Academic Press, second ed. (2003)