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Volumn 6730, Issue , 2007, Pages

Performance comparison of techniques for intra-field CD control improvement

Author keywords

AIMS; CD control; CDC; DoseMapper; Femto laser; IF CDU; Photomask; Shading elements

Indexed keywords

ERROR ANALYSIS; PHOTOMASKS;

EID: 42149109038     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746695     Document Type: Conference Paper
Times cited : (16)

References (10)
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    • J. van Schoot et al..: "CD uniformity improvement by active scanner corrections", Proc. SPIE Vol. 4691, p.304-314 (2002)
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    • van Schoot, J.1    et, al..2
  • 2
    • 25144482322 scopus 로고    scopus 로고
    • Etch, Reicle, and Track CD Fingerprint Corrections with Local Dose Compensation
    • H. van der Laan et al..: "Etch, Reicle, and Track CD Fingerprint Corrections with Local Dose Compensation", Proc. SPIE Vol. 5755, p. 107-118 (2005)
    • (2005) Proc. SPIE , vol.5755 , pp. 107-118
    • van der Laan, H.1    et, al..2
  • 3
    • 0141498932 scopus 로고    scopus 로고
    • Improvement of shot uniformity on wafer by controlling backside transmittance distribution of a photomask
    • J. R. Park et al..: "Improvement of shot uniformity on wafer by controlling backside transmittance distribution of a photomask", Proc. SPIE Vol. 5040, p. 553-559 (2004)
    • (2004) Proc. SPIE , vol.5040 , pp. 553-559
    • Park, J.R.1    et, al..2
  • 4
    • 33745587521 scopus 로고    scopus 로고
    • CD Variations Correction by Local Transmission Control of Photomasks done with a Novel Laser based Process
    • E. Zait et al..: "CD Variations Correction by Local Transmission Control of Photomasks done with a Novel Laser based Process", SPIE Proc. 6152-76 (2006)
    • (2006) SPIE Proc , vol.6152 -76
    • Zait, E.1    et, al..2
  • 6
    • 33846587519 scopus 로고    scopus 로고
    • Determination of the spatial CD signature on Photomasks
    • M. Utzny, M, Roessiger: "Determination of the spatial CD signature on Photomasks", Proc. SPIE Vol. 6349, 731-748 (2006)
    • (2006) Proc. SPIE , vol.6349 , pp. 731-748
    • Utzny, M.1    Roessiger, M.2
  • 8
    • 33846604237 scopus 로고    scopus 로고
    • Improved prediction of Across Chip Linewidth Variation (ACLV) with photomask aerial image CD metrology
    • Photomask Technology
    • Poortinga et al..: "Improved prediction of Across Chip Linewidth Variation (ACLV) with photomask aerial image CD metrology", Proc. SPIE Vol. 6349, Photomask Technology, 2006.
    • (2006) Proc. SPIE , vol.6349
    • Poortinga1    et, al..2
  • 10
    • 42149151150 scopus 로고    scopus 로고
    • Mask CD Control (CDC) with Ultrafast Laser for Improving Mask CDU Using AIMS™ as the CD Metrology Data Source
    • Monterey
    • th Bacus Conference, Monterey 2007
    • (2007) th Bacus Conference
    • Ben Zvi, G.1    et, al..2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.