CD variations correction by local transmission control of photomasks done with a novel laser based process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Zait, Eitan ^a   Dmitriev, Vladimir ^a   Oshemkov, Sergey ^a   Ben Zvi, Guy ^a   Michaelis, Dany ^a  

^a UCLT Ltd   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DENSITY (OPTICAL); LASER BEAMS; LASERS; QUARTZ; SCANNING ELECTRON MICROSCOPY;

AUTOMATIC RETICLE INSPECTION TOOL; TRANSPARENT MEDIA; ULTRA-SHORT LASER PULSES;

NETWORK PROTOCOLS;

EID: 33745587521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656337     Document Type: Conference Paper

References (5)

1. G.Ben-Zvi et al; "Photomask Clear Defects Repair Using Ultrafast Laser Technology", Proc. SPIE, Vol. 5446. p.357- 363 (2004).
2. Jong R. Park et al, "Improvement of Shot Uniformity on a Wafer by Controlling Backside Transmittance distribution of a Photomask" Optical Microlithography XVI.Proceedings of the SPIE, Volume 5040, pp. 553-560 (2003).
3. Alfred Kuok-Kit Wong; "Resolution enhancement techniques in optical lithography", Tutorial texts in optical Engineering, Volume TT47, SPIE press, 2001, chapter 2.7.3-2.7.9
4. B.Stuart, M.Feit, S.Herman, et. al.; "Nanosecond-to-femtosecond laser-induced breakdown in dielectrics", Phys. Rev. B, Vol. 53, p. 1749 (1996).
5. C.Schaffer, A.Jamison and E.Mazur; "Morphology of femtosecond laser- induced structural changes in bulk transparent materials", Appl. Phys. Lett., Vol. 84, p. 1441-1443 (2004).