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Applied Physics Letters

Volumn 94, Issue 10, 2009, Pages

Phase stability of cubic Mg0.55Zn0.45O thin film studied by continuous thermal annealing method

(8) Ju, Z G a,b Shan, C X a Yang, C L c Zhang, J Y a Yao, B a Zhao, D X a Shen, D Z a Fan, X W a

a CHANGCHUN INSTITUTE OF OPTICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

c SUN YAT SEN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFRACTION; HOLOGRAPHIC INTERFEROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; PHASE SEPARATION; THIN FILM DEVICES; THIN FILMS; ZINC;

CRYSTAL QUALITIES; HIGHER TEMPERATURES; METAL-ORGANIC CHEMICAL VAPOR DEPOSITIONS; OPTICAL TRANSMISSION SPECTRUM; PHASE SEGREGATIONS; SURFACE SMOOTHNESS; THERMAL-ANNEALING; X-RAY DIFFRACTION PATTERNS;

PHASE STABILITY;

EID: 62549113517 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3097022 Document Type: Article

Times cited : (37)

References (14)

1
- 31144475928
- 0003-6951 10.1063/1.2166686.
- S. J. Jiao, Z. Z. Zhang, Y. M. Lu, D. Z. Shen, B. Yao, J. Y. Zhang, B. H. Li, D. X. Zhao, X. W. Fan, and Z. K. Tang, Appl. Phys. Lett. 0003-6951 10.1063/1.2166686 88, 031911 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 031911
- Jiao, S.J.¹ Zhang, Z.Z.² Lu, Y.M.³ Shen, D.Z.⁴ Yao, B.⁵ Zhang, J.Y.⁶ Li, B.H.⁷ Zhao, D.X.⁸ Fan, X.W.⁹ Tang, Z.K.¹⁰

2
- 55849088744
- 0003-6951 10.1063/1.3012579.
- S. Chu, M. Olmedo, Z. Yang, J. Kong, and J. L. Liu, Appl. Phys. Lett. 0003-6951 10.1063/1.3012579 93, 181106 (2008).
- (2008) Appl. Phys. Lett. , vol.93 , pp. 181106
- Chu, S.¹ Olmedo, M.² Yang, Z.³ Kong, J.⁴ Liu, J.L.⁵

3
- 0035333303
- 0022-0248 10.1016/S0022-0248(01)00830-2.
- S. Liang, H. Sheng, Y. Liu, Z. Huo, Y. Lu, and H. Shen, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(01)00830-2 225, 110 (2001).
- (2001) J. Cryst. Growth , vol.225 , pp. 110
- Liang, S.¹ Sheng, H.² Liu, Y.³ Huo, Z.⁴ Lu, Y.⁵ Shen, H.⁶

4
- 55149105930
- 0003-6951 10.1063/1.3000604.
- L. Dunlop, A. Kursumovic, and J. L. MacManus-Driscoll, Appl. Phys. Lett. 0003-6951 10.1063/1.3000604 93, 172111 (2008).
- (2008) Appl. Phys. Lett. , vol.93 , pp. 172111
- Dunlop, L.¹ Kursumovic, A.² MacManus-Driscoll, J.L.³

5
- 44449125818
- 0003-6951 10.1063/1.2937124.
- M. Dutta and D. Basak, Appl. Phys. Lett. 0003-6951 10.1063/1.2937124 92, 212112 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 212112
- Dutta, M.¹ Basak, D.²

6
- 0000939615
- 0003-6951 10.1063/1.121384.
- A. Ohtomo, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda, and Y. Segawa, Appl. Phys. Lett. 0003-6951 10.1063/1.121384 72, 2466 (1998).
- (1998) Appl. Phys. Lett. , vol.72 , pp. 2466
- Ohtomo, A.¹ Kawasaki, M.² Koida, T.³ Masubuchi, K.⁴ Koinuma, H.⁵ Sakurai, Y.⁶ Yoshida, Y.⁷ Yasuda, T.⁸ Segawa, Y.⁹

7
- 0032659122
- 0021-4922 10.1143/JJAP.38.L603.
- Y. Matsumoto, M. Murakami, Z. W. Jin, A. Ohtomo, M. Lippmaa, M. Kawasaki, and H. Koinuma, Jpn. J. Appl. Phys., Part 2 0021-4922 10.1143/JJAP.38.L603 38, L603 (1999).
- (1999) Jpn. J. Appl. Phys., Part 2 , vol.38 , pp. 603
- Matsumoto, Y.¹ Murakami, M.² Jin, Z.W.³ Ohtomo, A.⁴ Lippmaa, M.⁵ Kawasaki, M.⁶ Koinuma, H.⁷

8
- 0035943846
- 0003-6951 10.1063/1.1405811.
- W. I. Park, G. -C. Yi, and H. M. Jang, Appl. Phys. Lett. 0003-6951 10.1063/1.1405811 79, 2022 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 2022
- Park, W.I.¹ Yi, G.-C.² Jang, H.M.³

9
- 79957929680
- 0003-6951 10.1063/1.1456266.
- S. Choopun, R. D. Vispute, W. Yang, R. P. Sharma, T. Venkatesan, and H. Shen, Appl. Phys. Lett. 0003-6951 10.1063/1.1456266 80, 1529 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1529
- Choopun, S.¹ Vispute, R.D.² Yang, W.³ Sharma, R.P.⁴ Venkatesan, T.⁵ Shen, H.⁶

10
- 55149123999
- 0003-6951 10.1063/1.3002371.
- Z. G. Ju, C. X. Shan, D. Y. Jiang, J. Y. Zhang, B. Yao, D. X. Zhao, D. Z. Shen, and X. W. Fan, Appl. Phys. Lett. 0003-6951 10.1063/1.3002371 93, 173505 (2008).
- (2008) Appl. Phys. Lett. , vol.93 , pp. 173505
- Ju, Z.G.¹ Shan, C.X.² Jiang, D.Y.³ Zhang, J.Y.⁴ Yao, B.⁵ Zhao, D.X.⁶ Shen, D.Z.⁷ Fan, X.W.⁸

11
- 0001272236
- 0003-6951 10.1063/1.125545.
- A. Ohtomo, R. Shiroki, I. Ohkubo, H. Koinuma, and M. Kawasaki, Appl. Phys. Lett. 0003-6951 10.1063/1.125545 75, 4088 (1999).
- (1999) Appl. Phys. Lett. , vol.75 , pp. 4088
- Ohtomo, A.¹ Shiroki, R.² Ohkubo, I.³ Koinuma, H.⁴ Kawasaki, M.⁵

12
- 0348050704
- 0003-6951 10.1063/1.1398619.
- S. J. Potashnik, K. C. Ku, S. H. Chun, J. J. Berry, N. Samarth, and P. Schiffer, Appl. Phys. Lett. 0003-6951 10.1063/1.1398619 79, 1495 (2001).
- (2001) Appl. Phys. Lett. , vol.79 , pp. 1495
- Potashnik, S.J.¹ Ku, K.C.² Chun, S.H.³ Berry, J.J.⁴ Samarth, N.⁵ Schiffer, P.⁶

13
- 4344614418
- 0031-9007 10.1103/PhysRevLett.92.037201.
- K. W. Edmonds, P. Bogusawski, K. Y. Wang, R. P. Campion, S. N. Novikov, N. R. S. Farley, B. L. Gallagher, C. T. Foxon, M. Sawicki, T. Dietl, M. Buongiorno Nardelli, and J. Bernholc, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.92.037201 92, 037201 (2004).
- (2004) Phys. Rev. Lett. , vol.92 , pp. 037201
- Edmonds, K.W.¹ Bogusawski, P.² Wang, K.Y.³ Campion, R.P.⁴ Novikov, S.N.⁵ Farley, N.R.S.⁶ Gallagher, B.L.⁷ Foxon, C.T.⁸ Sawicki, M.⁹ Dietl, T.¹⁰ Buongiorno Nardelli, M.¹¹ Bernholc, J.¹²

14
- 34249086959
- 0361-5235 10.1007/s11664-006-0042-z.
- S. B. Xue, H. Z. Zhuang, C. S. Xue, L. J. Hu, B. Li, and S. Y. Zhang, J. Electron. Mater. 0361-5235 10.1007/s11664-006-0042-z 36, 502 (2007).
- (2007) J. Electron. Mater. , vol.36 , pp. 502
- Xue, S.B.¹ Zhuang, H.Z.² Xue, C.S.³ Hu, L.J.⁴ Li, B.⁵ Zhang, S.Y.⁶

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