Development of EUV lithography tools in Nikon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Kondo, Hiroyuki ^a   Chiba, Hiorshi ^a   Nomura, Kazushi ^a   Kawai, Hidemi ^a   Kohama, Yoshiaki ^a   Morita, Kenji ^a   Hada, Kazunari ^a   Ohkubo, Yukiharu ^a   Miura, Takaharu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aspheric mirrors; EUVL; Illumination optics; Multilayer coatings; Projection optics

Indexed keywords

ASPHERIC MIRRORS; EUVL; ILLUMINATION OPTICS; MULTILAYER COATINGS; PROJECTION OPTICS;

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; METALLIC COMPOUNDS; MIRRORS; MULTILAYERS; OXYGEN; ULTRAVIOLET DEVICES;

OPTICS;

EID: 62449117700     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804706     Document Type: Conference Paper

References (6)

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6. I. Mori, O. Suga, H. Tanaka, I. Nishiyama, T. Terasawa, H. Shigemura, T. Taguchi, T. Tanaka and T. Itani, "Selete's EUV program: progress and challenges", Proc. SPIE 6921, 692102 (2008).